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美国商务部长霍华德·卢特尼克在与荷兰半导体设备巨头艾司摩尔(ASML)高层的会议中警告,该公司的一台先进极紫外光(EUV)微影机可能已流入中国,这涉嫌违反了美国主导的出口管制禁令。

艾司摩尔对此指控表示反对与澄清,强调该公司从未向中国出货过任何EUV微影机,且一直严格遵守深紫外光(DUV)设备的出口管制限制。

此事件可能使美欧关系面临进一步的紧张,但分析师指出,要使用艾司摩尔的先进设备制造晶片,还需要其他同样受限的外国设备支援,因此中国的晶片进展可能更多源于其工程技术的突破。

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US Commerce Secretary Howard Lutnick warned ASML's senior leaders that one of its advanced extreme ultraviolet (EUV) lithography machines may have reached China, potentially violating US-led export restrictions.

ASML has pushed back against these suggestions, clarifying that it has never shipped any EUV machines to China and that it remains in full compliance with export controls.

The situation could further strain US-EU relations, though analysts suggest that operating such tools requires other restricted foreign technologies, indicating China's progress may stem from engineering advances with legacy tools.
2026-06-20 (Saturday) · 14dc02f25eab82bfb21b0fdbfd957fd2fab592bb